The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2020
Filed:
Feb. 14, 2017
Nokia Technologies Oy, Espoo, FI;
Muninder Veldandi, Sunnyvale, CA (US);
Prasad Balasubramanian, Sunnyvale, CA (US);
Nokia Technologies Oy, Espoo, FI;
Abstract
A method, apparatus and computer program products are provided for reducing artifacts in a seam region when stitching overlapping images. One example method includes extracting the seam region from the overlapping images, wherein the overlapping images comprise a first image captured by a first image capturing device and a second image captured by a second image capturing device, the overlapping images sharing the seam region, the seam region being a region of each of the first image and the second images depicting a common captured area, applying a set of convergence values to the seam region generating a plurality of strips corresponding to the seam region, dividing the plurality of strips into multiple vertical segments, and computing an optimal convergence for each of the multiple vertical segments.