The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2020

Filed:

Nov. 04, 2019
Applicant:

Richard H. Vollmerhausen, Lake Mary, FL (US);

Inventor:

Richard H. Vollmerhausen, Lake Mary, FL (US);

Assignee:

Other;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 23/24 (2006.01); G01S 13/89 (2006.01); H01Q 21/06 (2006.01); H01L 27/146 (2006.01); H01Q 3/26 (2006.01);
U.S. Cl.
CPC ...
G02B 23/2484 (2013.01); G01S 13/89 (2013.01); H01L 27/14643 (2013.01); H01Q 3/2658 (2013.01); H01Q 21/064 (2013.01);
Abstract

Plane Wave Imagers (PWI) directly sense the amplitude and phase of electromagnetic waves and do not require a lens to image a scene. PWI's can also be used in the exit pupil of an afocal lens. PWI's are implemented in CMOS using silicon waveguide technology. Since the wavelength of light ranges from less than one to tens of microns, PWI's fabricated on silicon are essentially flat plates, making a PWI a thin and light structure. A CMOS PWI can operate in the visible, near infrared, short wave infrared, and mid wave thermal spectral bands. Benefits of using a PWI include the ability to achieve large optical aperture performance by digitally processing the outputs of multiple small aperture PWI's that are not necessarily precisely optically aligned. Enhanced scene resolution can be obtained by collecting imagery from several adjacent positions and then digitally combining the digital data into one large dataset.


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