The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2020
Filed:
Mar. 24, 2016
Lpe S.p.a., Baranzate, IT;
Francesco Corea, Baranzate, IT;
Danilo Crippa, Baranzate, IT;
Laura Gobbo, Baranzate, IT;
Marco Mauceri, Baranzate, IT;
Vincenzo Ogliari, Baranzate, IT;
Franco Preti, Baranzate, IT;
Marco Puglisi, Baranzate, IT;
Carmelo Vecchio, Baranzate, IT;
LPE S.P.A., Baranzate (MI), IT;
Abstract
The present invention mainly relates to a susceptor for a reactor for epitaxial growth, comprising: a disc-shaped body () having a first face and a second face, wherein the first face comprises at least one zone () adapted to receive a substrate () to be subjected to epitaxial growth and at least one supporting element () for the substrate (), located at the zone (); the supporting element () comprises a circular disc () with an edge () which is raised with respect to the disc; the zone () may be a bottom of a recess () or a top of a relief of the disc-shaped body (); the disc-shaped body () is solid at least at the recess () or relief; the edge is accessible from a side of the susceptor for handling the supporting element.