The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2020
Filed:
May. 25, 2017
Shanghai Tianma Micro-electronics Co., Ltd., Shanghai, CN;
Tianma Micro-electronics Co., Ltd., Shenzhen, CN;
Jian Xu, Shanghai, CN;
Yaoyang Liu, Shanghai, CN;
SHANGHAI TIANMA MICRO-ELECTRONICS CO., LTD., Shanghai, CN;
TIANMA MICRO-ELECTRONICS CO., LTD., Shenzhen, CN;
Abstract
Embodiments of the present disclosure disclose an evaporating device and an evaporating method. The evaporating device comprises: a Halbach magnet array and a mask setting region. A magnetization direction of at least part of the Halbach magnet array precesses clockwise or counter-clockwise, so that magnetic fields having different magnetic fields are formed at two sides of the Halbach magnet array; and the mask setting region is disposed within the magnetic field at one side of the Halbach magnet array. The mask of the ferromagnetic material is placed in the evaporating device provided by the embodiments of the present disclosure. The mask is subject to an attractive force of the Halbach magnet array.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile