The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2020
Filed:
Jun. 06, 2017
Vanderbilt University, Nashville, TN (US);
John T. Wilson, Nashville, TN (US);
Daniel Shae, Nashville, TN (US);
Vanderbilt University, Nashville, TN (US);
Abstract
A diblock copolymer, polymer vesicle, and method of forming a polymer vesicle are provided. The diblock polymer includes a hydrophilic first block and a second block including amine containing monomers and hydrophobic monomers. The polymer vesicle includes a diblock copolymer with a hydrophilic first block and a second block including amine containing monomers and hydrophobic monomers, and at least one active agent loaded in the polymer vesicle. The second block forms an inner hydrophobic domain of a vesicle membrane and the hydrophilic block forms a corona facing the exterior and aqueous interior of the vesicle membrane, the corona providing an outer shell that stabilizes the vesicle in aqueous media. The method of forming the polymer vesicle includes synthesizing the diblock copolymer through a polymerization technique selected from the group consisting of addition polymerization, condensation polymerization, and a combination thereof, providing at least one active agent, and assembling the polymer vesicle, the diblock copolymer including a hydrophilic first block and a second block with amine containing monomers and hydrophobic monomers.