The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2020
Filed:
Dec. 07, 2017
Fina Technology, Inc., Houston, TX (US);
Carlos De Anda, Pearland, TX (US);
Giovanni Trimino, Houston, TX (US);
Brad Stiles, Houston, TX (US);
FINA TECHNOLOGY, INC., Houston, TX (US);
Abstract
A method including operating a high impact polystyrene (HIPS) reaction system having a devolatilizer downstream of a polymerization reactor, and from which a HIPS product is obtained, and injecting an antioxidant into the HIPS reaction system prior to the devolatilizer, with the antioxidant being one or more aromatic antioxidants. A HIPS product produced by operating a HIPS reaction system to produce a HIPS product, with the HIPS reaction system including a devolatilizer downstream of a polymerization reactor, and including injecting an antioxidant into the HIPS reaction system prior to the devolatilizer, with the antioxidant being comprising one or more aromatic antioxidants. The antioxidant may comprise at least one thiol group, at least one cresol group, or both. A system for producing the HIPS product is also provided.