The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2020
Filed:
Jul. 09, 2019
Applicant:
Honeywell International Inc., Morris Plains, NJ (US);
Inventors:
Haridasan K. Nair, Williamsville, NY (US);
Rajiv Ratna Singh, Getzville, NY (US);
Mark Makar, Buffalo, NY (US);
Assignee:
HONEYWELL INTERNATIONAL INC., Morris Plains, NJ (US);
Primary Examiner:
Int. Cl.
CPC ...
C07C 17/25 (2006.01); C07C 21/18 (2006.01);
U.S. Cl.
CPC ...
C07C 17/25 (2013.01); C07C 21/18 (2013.01); C07C 2521/06 (2013.01);
Abstract
Disclosed are processes for the dechlorination of haloethanes comprising reacting in the gaseous phase a haloethane and reducing agent such as an alkene, an alkane, hydrogen or combinations of two or more of these, in the presence of a silicon-based catalyst.
Nair, Haridasan. (2020). Gas phase process for chlorotrifluoroethylene (U.S. Patent No. 10696613). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10696613
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile