The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2020

Filed:

Oct. 27, 2015
Applicant:

Sumitomo Metal Mining Co., Ltd., Tokyo, JP;

Inventors:

Hiroshi Okada, Niihama, JP;

Yu Yamashita, Niihama, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22F 1/00 (2006.01); B22F 9/24 (2006.01); C25C 5/02 (2006.01); H01B 1/00 (2006.01); H01B 1/22 (2006.01); H01B 5/00 (2006.01);
U.S. Cl.
CPC ...
B22F 1/0007 (2013.01); B22F 1/00 (2013.01); B22F 9/24 (2013.01); C25C 5/02 (2013.01); H01B 1/00 (2013.01); H01B 1/22 (2013.01); H01B 5/00 (2013.01); B22F 2301/10 (2013.01); B22F 2304/10 (2013.01); B22F 2999/00 (2013.01); Y02P 10/236 (2015.11);
Abstract

Provided is a copper powder which can be suitably utilized in applications such as an electrically conductive paste and an electromagnetic wave shield. A copper powder according to the present invention has a dendritic shape having a linearly grown main stem and a plurality of branches separated from the main stem, the main stem and the branches are constituted as flat plate-shaped copper particles having a cross-sectional average thickness of from 0.02 μm to 5.0 μm to be determined by scanning electron microscopic SEM observation gather, the average particle diameter D50 of the copper powder is from 1.0 μm to 100 μm, and the maximum height in the vertical direction with respect to the flat plate-shaped surface of the copper particles is 1/10 or less with respect to the maximum length in the horizontal direction of the flat plate-shaped surface of the copper particles.


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