The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2020

Filed:

Apr. 05, 2016
Applicant:

Semiconductor Energy Laboratory Co., Ltd., Atsugi-shi, Kanagawa-ken, JP;

Inventors:

Satoshi Toriumi, Kanagawa, JP;

Takashi Hamada, Kanagawa, JP;

Tetsunori Maruyama, Kanagawa, JP;

Yuki Imoto, Kanagawa, JP;

Yuji Asano, Kanagawa, JP;

Ryunosuke Honda, Kanagawa, JP;

Shunpei Yamazaki, Tokyo, JP;

Assignee:

Semiconductor Energy Laboratory Co., Ltd., Atsugi-shi, Kanagawa-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); H01L 29/24 (2006.01); H01L 29/51 (2006.01); H01L 29/49 (2006.01); H01L 29/417 (2006.01); H01L 27/12 (2006.01); H01L 27/146 (2006.01); H01L 27/1156 (2017.01); H01L 27/06 (2006.01); H01L 29/423 (2006.01); H01L 21/822 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7869 (2013.01); H01L 21/8221 (2013.01); H01L 27/0688 (2013.01); H01L 27/1156 (2013.01); H01L 27/1207 (2013.01); H01L 27/1225 (2013.01); H01L 27/14645 (2013.01); H01L 27/14649 (2013.01); H01L 29/24 (2013.01); H01L 29/41733 (2013.01); H01L 29/42384 (2013.01); H01L 29/4908 (2013.01); H01L 29/517 (2013.01); H01L 29/78648 (2013.01); H01L 29/78696 (2013.01);
Abstract

A minute transistor with low parasitic capacitance, high frequency characteristics, favorable electrical characteristics, stable electrical characteristics, and low off-state current is provided. A semiconductor device includes a semiconductor over a substrate, a source and a drain over the semiconductor, a first insulator over the source and the drain, a second insulator over the semiconductor, a third insulator in contact with a side surface of the first insulator and over the second insulator, and a gate over the third insulator. The semiconductor includes a first region overlapping with the source, a second region overlapping with the drain, and a third region overlapping with the gate. The length between a top surface of the third region of the semiconductor and a bottom surface of the gate is longer than the length between the first region and the third region.


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