The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2020
Filed:
Dec. 19, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventor:
Majeed A. Foad, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 1/22 (2012.01); H01L 21/683 (2006.01); G03F 1/60 (2012.01);
U.S. Cl.
CPC ...
G03F 1/22 (2013.01); G03F 1/60 (2013.01); G03F 7/70708 (2013.01); G03F 7/70783 (2013.01); G03F 7/70875 (2013.01); H01L 21/6831 (2013.01); G03F 7/2004 (2013.01);
Abstract
An EUV lithography system and method of manufacturing thereof includes: an EUV light source; a chuck being thermally conducting and smooth having a surface with a predetermined chuck flatness; and a reflective lens system for directing EUV light from the EUV light source over the surface of the chuck.