The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2020

Filed:

Feb. 26, 2018
Applicant:

Nlight, Inc., Vancouver, WA (US);

Inventors:

Scott Karlsen, Battle Ground, WA (US);

Robert Martinsen, Portland, OR (US);

Dahv A. V. Kliner, Portland, OR (US);

Roger Farrow, Vancouver, WA (US);

Assignee:

NLIGHT, INC., Vancouver, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/09 (2006.01); B33Y 30/00 (2015.01); B23K 26/06 (2014.01); B23K 26/073 (2006.01); G02B 6/26 (2006.01); G02B 6/42 (2006.01); G02F 1/01 (2006.01); G02B 6/028 (2006.01); G02B 6/036 (2006.01); G02B 6/14 (2006.01); G02B 6/255 (2006.01); G02B 6/12 (2006.01); G02F 1/015 (2006.01); G02B 6/02 (2006.01); B22F 3/105 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0994 (2013.01); B23K 26/0643 (2013.01); B23K 26/0648 (2013.01); B23K 26/073 (2013.01); B33Y 30/00 (2014.12); G02B 6/262 (2013.01); G02B 6/4296 (2013.01); G02B 27/0927 (2013.01); G02B 27/0933 (2013.01); G02F 1/0115 (2013.01); B22F 2003/1056 (2013.01); G02B 6/02076 (2013.01); G02B 6/0281 (2013.01); G02B 6/02147 (2013.01); G02B 6/03627 (2013.01); G02B 6/03633 (2013.01); G02B 6/03638 (2013.01); G02B 6/14 (2013.01); G02B 6/255 (2013.01); G02B 6/4206 (2013.01); G02B 2006/12121 (2013.01); G02F 2001/0151 (2013.01);
Abstract

An apparatus for heat deposition in additive manufacturing may include: a first optical beam source configured to generate a first optical beam; a second optical beam source configured to generate a second optical beam; and/or an optical system. The optical system may be configured to move the generated first optical beam over a target area. The optical system may be further configured to move the generated second optical beam over the target area so that a path of the second optical beam moving over the target area is dithered about a path of the first optical beam moving over the target area. The optical system may be configured to focus the generated first optical beam at a plane of a target area. The optical system may be further configured to focus the generated second optical beam at the plane of the target area.


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