The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2020

Filed:

Apr. 27, 2018
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Quan Zhu, Lincolnshire, IL (US);

Gaohong Wu, New Berlin, WI (US);

Shaorong Chang, Hartland, WI (US);

Richard Hinks, Waukesha, WI (US);

Assignee:

GENERAL ELECTRIC COMPANY, Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 33/565 (2006.01); G01R 33/563 (2006.01);
U.S. Cl.
CPC ...
G01R 33/56554 (2013.01); G01R 33/56341 (2013.01); G01R 33/56509 (2013.01);
Abstract

Various methods and systems are provided for ghost artifact reduction in magnetic resonance imaging (MRI). In one embodiment, a method for an MRI system comprises acquiring a non-phase-encoded reference dataset, calculating phase corrections for spatial orders higher than first order from the non-phase-encoded reference dataset, acquiring a phase-encoded k-space dataset, correcting the phase-encoded k-space dataset with the phase corrections, and reconstructing an image from the corrected phase-encoded k-space dataset. In this way, ghost artifacts caused by phase errors during EPI may be substantially reduced, thereby improving image quality especially when imaging with a large field of view.


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