The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2020

Filed:

Feb. 15, 2019
Applicant:

The Regents of the University of California, Oakland, CA (US);

Inventors:

Dino Di Carlo, Los Angeles, CA (US);

Wonhee Lee, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/14 (2006.01); F17D 1/00 (2006.01);
U.S. Cl.
CPC ...
F17D 1/00 (2013.01); G01N 15/1404 (2013.01); G01N 2015/1415 (2013.01); Y10T 137/85978 (2015.04);
Abstract

A particle focusing system includes an inlet; an inertial focusing microchannel disposed in a substrate and connected to the inlet; and a pressure/flow source configured to drive a particle-containing fluid through the inertial focusing microchannel, where the inertial focusing microchannel includes a side wall having an irregular surface. The side wall includes a first irregularity protruding from a baseline surface away from a longitudinal axis of the inertial focusing microchannel. Alternatively or additionally, the first irregularity and the baseline surface form an angle more than or equal to 135 degrees. The inertial focusing microchannel may have a substantially rectangular cross-section having a height and a width, and a ratio of height to width is approximately 5:4 to 4:1. The system may also include a downstream expanding region having a side wall, where the side wall has a stepped surface.


Find Patent Forward Citations

Loading…