The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2020

Filed:

Jun. 21, 2017
Applicant:

Kuraray Co., Ltd., Kurashiki-shi, JP;

Inventor:

Masashi Meguro, Okayama, JP;

Assignee:

KURARAY CO., LTD., Kurashiki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D06N 3/00 (2006.01); D06N 3/18 (2006.01);
U.S. Cl.
CPC ...
D06N 3/0075 (2013.01); D06N 3/00 (2013.01); D06N 3/0004 (2013.01); D06N 3/0011 (2013.01); D06N 3/183 (2013.01); D06N 2211/28 (2013.01); D06N 2213/03 (2013.01);
Abstract

Disclosed is a napped artificial leather including: a fabric that has been impregnated with a first elastic polymer and that has a napped surface including napped ultrafine fibers with an average fineness of 0.01 to 0.5 dtex, wherein the napped surface has, as measured by a surface roughness measurement in accordance with ISO 25178, an arithmetic mean height (Sa) of 30 μm or less in both a grain direction and a reverse grain direction, and a density of peaks (Spd) having a height of 100 μm or more from a mean height, of 30/432 mmor less in both of the grain direction and the reverse grain direction, and a difference (absolute value) in the density of peaks (Spd) between the grain direction and the reverse grain direction is 20/432 mmor less.


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