logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10689500 B1

PDFFull Text
Date of Patent:
Jun. 23, 2020

Filed:

Feb. 08, 2017

High molecular weight polystyrene in inks and coatings

Applicant:

Sun Chemical Corporation, Parsippany, NJ (US);

Inventors:

Michael J. Jurek, Oak Ridge, NJ (US);

John G. Tiessen, Cook, IL (US);

Soichiro Omizu, Aomori, JP;

Juanita M. Parris, Montvale, NJ (US);

Assignee:

Sun Chemical Corporation, Parsippany, NJ (US);

Attorneys:

Charles C. Achkar

Ostrolenk Faber LLP.

Primary Examiner:

Terressa Boykin

Int. Cl.
CPC ...
C08F 8/50 (2006.01); C08J 11/10 (2006.01); C08F 257/02 (2006.01); C09D 11/101 (2014.01); C09D 151/00 (2006.01); C09D 11/106 (2014.01); C08F 285/00 (2006.01); C08F 212/08 (2006.01); C08F 299/00 (2006.01); C08F 12/08 (2006.01); C09D 11/037 (2014.01); C09D 11/107 (2014.01);
U.S. Cl.
CPC ...
C08J 11/10 (2013.01); C08F 8/50 (2013.01); C08F 12/08 (2013.01); C08F 212/08 (2013.01); C08F 257/02 (2013.01); C08F 285/00 (2013.01); C08F 299/00 (2013.01); C09D 11/037 (2013.01); C09D 11/101 (2013.01); C09D 11/106 (2013.01); C09D 11/107 (2013.01); C09D 151/003 (2013.01); C08J 2325/06 (2013.01);
Abstract

Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.

Find Patent Forward Citations

Jurek, Michael. (2020). High molecular weight polystyrene in inks and coatings (U.S. Patent No. 10689500). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10689500

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…