The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2020
Filed:
Apr. 26, 2017
Applicant:
University of Southern California, Los Angeles, CA (US);
Inventors:
Yong Chen, Los Angeles, CA (US);
Yuanrui Li, Los Angeles, CA (US);
Huachao Mao, Los Angeles, CA (US);
Wei Wu, Los Angeles, CA (US);
Assignee:
University of Southern California, Los Angeles, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/42 (2006.01); G02B 27/09 (2006.01); G02B 26/10 (2006.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B29C 67/00 (2017.01); B29C 64/277 (2017.01); B29C 64/135 (2017.01); B29C 64/386 (2017.01); G02B 5/00 (2006.01); G02B 5/22 (2006.01);
U.S. Cl.
CPC ...
B33Y 30/00 (2014.12); B29C 64/135 (2017.08); B29C 64/277 (2017.08); B29C 64/386 (2017.08); B33Y 10/00 (2014.12); G02B 27/0988 (2013.01); G02B 5/005 (2013.01); G02B 5/22 (2013.01); G02B 26/101 (2013.01);
Abstract
A three-dimensional printing approach based on stereolithography with variable printing resolutions to solve the trade-off between throughput and resolution. In this technology, the variable fabrication resolutions are achieved by switching light wavelength. The apparatus includes an optical filter based on high-contrast gratings. In one embodiment, the minimum printing resolution of the accordingly constructed stereolithography apparatus is reduced to 37 μm.