The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2020

Filed:

Jan. 18, 2018
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Anping Liu, Horseheads, NY (US);

Matthew Ryan Ross, Big Flats, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/53 (2014.01); B23K 26/364 (2014.01); B23K 26/0622 (2014.01); B23K 26/067 (2006.01); B23K 26/073 (2006.01); C03B 9/12 (2006.01); C03C 14/00 (2006.01); C03B 33/02 (2006.01); C03C 3/093 (2006.01); B23K 26/06 (2014.01); B23K 26/064 (2014.01); B23K 103/00 (2006.01);
U.S. Cl.
CPC ...
B23K 26/53 (2015.10); B23K 26/064 (2015.10); B23K 26/0617 (2013.01); B23K 26/0624 (2015.10); B23K 26/0676 (2013.01); B23K 26/073 (2013.01); B23K 26/364 (2015.10); C03B 9/12 (2013.01); C03B 33/0215 (2013.01); C03B 33/0222 (2013.01); C03C 3/093 (2013.01); C03C 14/006 (2013.01); B23K 2103/52 (2018.08); B23K 2103/54 (2018.08);
Abstract

A method for laser processing a transparent workpiece includes forming a contour line having defects in the transparent workpiece, which includes directing a pulsed laser beam oriented along a beam pathway through a beam converting element and through a phase modifying optical element such that the portion of the pulsed laser beam directed into the transparent workpiece includes a phase shifted focal line having a cross-sectional phase contour that includes phase contour ridges induced by the phase modifying optical element and extending along phase ridge lines. Moreover, the phase shifted focal line generates an induced absorption within the transparent workpiece to produce a defect within the transparent workpiece including a central defect region and a radial arm that extends outward from the central defect region in a radial defect direction oriented within 20° of the phase ridge lines of the phase shifted focal line.


Find Patent Forward Citations

Loading…