The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2020

Filed:

Jul. 05, 2017
Applicants:

Shanghai Tianma Am-oled Co., Ltd., Shanghai, CN;

Tianma Micro-electronics Co.,ltd., Shenzhen, CN;

Inventors:

Xiangcheng Wang, Shanghai, CN;

Wei He, Shanghai, CN;

Ying Liu, Shanghai, CN;

Jinghua Niu, Shanghai, CN;

Yuji Hamada, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); C07C 211/58 (2006.01); C07C 211/54 (2006.01); C07C 211/60 (2006.01); H01L 51/50 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
H01L 51/006 (2013.01); C07C 211/54 (2013.01); C07C 211/58 (2013.01); C07C 211/60 (2013.01); H01L 51/005 (2013.01); H01L 51/0059 (2013.01); C07C 2602/10 (2017.05); H01L 51/0052 (2013.01); H01L 51/0058 (2013.01); H01L 51/0072 (2013.01); H01L 51/0077 (2013.01); H01L 51/0085 (2013.01); H01L 51/5036 (2013.01); H01L 51/5056 (2013.01); H01L 51/5072 (2013.01); H01L 51/5088 (2013.01); H01L 51/5092 (2013.01); H01L 51/5206 (2013.01); H01L 51/5221 (2013.01); H01L 51/5265 (2013.01); H01L 2251/5376 (2013.01); H01L 2251/558 (2013.01);
Abstract

The present invention relates to a hole transporting material having a structure of formula (I). The present invention provides a hole transporting material having at least one saturated six-membered carbon ring and benzene ring(s) having non-hydrogen substituent(s) in the formula and being capable of obtaining a suitable mobility rate without occurrence of crosstalk between pixels; and the hole transporting material provided by the present invention is capable of satisfying the requirements on MASK cleaning in terms of solubility (NMP solvent).


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