The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2020
Filed:
Jul. 19, 2018
Applicant:
Vanguard International Semiconductor Corporation, Hsinchu, TW;
Inventor:
Francois Hebert, Hsinchu, TW;
Assignee:
Vanguard International Semiconductor Corporation, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/08 (2006.01); H01L 29/06 (2006.01); H01L 29/26 (2006.01); H01L 21/02 (2006.01); H01L 21/8238 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0847 (2013.01); H01L 21/02458 (2013.01); H01L 21/02472 (2013.01); H01L 21/823814 (2013.01); H01L 21/823878 (2013.01); H01L 29/0642 (2013.01); H01L 29/26 (2013.01);
Abstract
A semiconductor structure includes an insulating substrate, an engineered layer, a semiconductor layer, and an isolation structure. The engineered layer is surrounding the insulating substrate. The semiconductor layer, which includes a first region and a second region,. is formed over the engineered layer. The isolation structure is formed in the semiconductor layer and located between the first region and the second region. A first transistor and a second transistor are formed in the first region and the second region respectively.