The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2020

Filed:

Apr. 18, 2016
Applicant:

Shimadzu Corporation, Kyoto-shi, Kyoto, JP;

Inventor:

Takahiro Harada, Kyoto, JP;

Assignee:

SHIMADZU CORPORATION, Kyoto-shi, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/16 (2006.01); G01N 27/62 (2006.01); H01J 49/04 (2006.01);
U.S. Cl.
CPC ...
H01J 49/164 (2013.01); G01N 27/62 (2013.01); H01J 49/0418 (2013.01);
Abstract

An aperture member including an opening having a predetermined shape and an image forming optical system having a short focal length are disposed at predetermined positions between a laser emitter and a sample, and a substantially square laser beam irradiation region is formed by reducing and forming an image of the opening shape on the sample. The aperture member and the image forming optical system are movable in an optical axis direction, and a size of substantially square laser beam irradiation region on the sample is variable. The size of the laser beam irradiation region is adjusted to a size of a unit attention region in an analysis target region on the sample, and a step width of scanning for moving the laser beam irradiation position is also adjusted to the size of the unit attention region.


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