The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2020
Filed:
Jan. 16, 2018
Washington University, St. Louis, MO (US);
Hongyu An, St. Louis, MO (US);
Meher Juttukonda, Nashville, TN (US);
Cihat Eldeniz, St. Louis, MO (US);
Yasheng Chen, St. Louis, MO (US);
WASHINGTON UNIVERSITY, St. Louis, MO (US);
Abstract
Systems and methods for producing pseudo-CT images using a dual flip angle multi-echo ultra-short echo time (DUFA-MUTE) MRI method are disclosed. The DUFA-MUTE MRI imaging method includes obtaining MR signals according to a DUFA-MUTE MRI sequence that includes first and second multiple ultrashort echo time (MUTE) sequence characterized by first and second flip angles FA1/FA2, and in which both MUTE sequences obtain MR signals at first and second echo times TE1/TE2. HU values are assigned to each imaged voxel based on each voxel's R1 value calculated from the MR signals, as well as each voxel's assigned tissue type. The imaged voxels and assigned HU values are combined to produce a pseudo-CT image. Pseudo-CT images optionally form the basis for attenuation maps suitable for use in combined PET/MRI systems and/or electron density maps suitable for use in radiation therapy systems.