The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2020

Filed:

Dec. 15, 2017
Applicant:

Central Glass Company, Limited, Ube-shi, Yamaguchi, JP;

Inventors:

Kenji Hosoi, Kawagoe, JP;

Mineo Watanabe, Kawagoe, JP;

Hideaki Imura, Fujimino, JP;

Kensuke Hirotaki, Kawagoe, JP;

Naoya Ueshima, Kawagoe, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 41/22 (2006.01); C07C 41/01 (2006.01); C07C 45/63 (2006.01);
U.S. Cl.
CPC ...
C07C 41/22 (2013.01); C07C 41/01 (2013.01); C07C 45/63 (2013.01);
Abstract

Fluoral is obtained by gas-phase fluorination of chloral in the presence of a catalyst and then reacted with trimethyl orthoformate, thereby readily forming 1,2,2,2-tetrafluoroethyl methyl ether as an intermediate for production of desflurane. 1,2,2,2-Tetrafluoroethyl difluoromethyl ether (desflurane) is produced with high yield from the thus-formed 1,2,2,2-tetrafluoroethyl methyl ether by chlorination and fluorination. This method enables efficient industrial-scale production of desflurane useful as an inhalation anesthetic.


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