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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10683185 B1

PDFFull Text
Date of Patent:
Jun. 16, 2020

Filed:

Feb. 14, 2019

Processing system and device manufacturing method

Applicant:

Nikon Corporation, Tokyo, JP;

Inventors:

Yoshiaki Kito, Kamakura, JP;

Masaki Kato, Yokohama, JP;

Kei Nara, Yokohama, JP;

Masakazu Hori, Tokyo, JP;

Assignee:

NIKON CORPORATION, Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

William B Perkey

Int. Cl.
CPC ...
B65H 20/34 (2006.01); B65H 20/02 (2006.01); B65H 20/24 (2006.01); B65H 18/10 (2006.01); B65H 23/188 (2006.01); G03F 7/16 (2006.01); G03F 7/24 (2006.01); G03F 9/00 (2006.01); G03F 7/30 (2006.01); H01L 21/677 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B65H 20/34 (2013.01); B65H 18/103 (2013.01); B65H 20/02 (2013.01); B65H 20/24 (2013.01); B65H 23/1888 (2013.01); G03F 7/16 (2013.01); G03F 7/24 (2013.01); G03F 7/3042 (2013.01); G03F 7/3064 (2013.01); G03F 7/3071 (2013.01); G03F 9/00 (2013.01); H01L 21/677 (2013.01); H01L 21/67173 (2013.01); H01L 21/67288 (2013.01); B65H 2511/112 (2013.01); B65H 2801/61 (2013.01);
Abstract

A processing system and a device manufacturing method that can perform manufacturing of an electronic device without stopping the entire manufacturing system, even when the processing state actually implemented on a sheet substrate by a processing device differs from the target processing state. A processing system for sequentially conveying a long, flexible sheet substrate along a length direction to each of a first through a third processing device to form a predetermined pattern on the sheet substrate, wherein the first through the third processing devices implement a predetermined process relating to the sheet substrate according to setting conditions set to each processing device, and when at least one from among the states of the actual processing implemented on the sheet substrate by each of the first through the third processing devices exhibits a processing error relative to a target processing state, changes other setting conditions, separate from the setting conditions exhibiting the processing error, according to the processing error.

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