The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2020

Filed:

Nov. 06, 2018
Applicant:

Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;

Inventors:

Toru Takayama, Toyama, JP;

Tougo Nakatani, Toyama, JP;

Takashi Kano, Shiga, JP;

Katsuya Samonji, Toyama, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 5/20 (2006.01); H01S 5/343 (2006.01); H01S 5/30 (2006.01); H01L 33/14 (2010.01); H01L 33/32 (2010.01); H01S 5/22 (2006.01); F21Y 115/30 (2016.01); F21S 41/176 (2018.01); F21S 41/16 (2018.01);
U.S. Cl.
CPC ...
H01S 5/34333 (2013.01); H01L 33/145 (2013.01); H01S 5/2009 (2013.01); H01S 5/3054 (2013.01); H01S 5/34346 (2013.01); F21S 41/16 (2018.01); F21S 41/176 (2018.01); F21Y 2115/30 (2016.08); H01L 33/32 (2013.01); H01S 5/22 (2013.01);
Abstract

A nitride-based light-emitting device includes, on a GaN substrate: a first-conductivity-side first semiconductor layer; an active layer; and a second-conductivity-side first semiconductor layer, in the stated order, and further includes an electron barrier layer of a second conductivity type between the active layer and the second-conductivity-side first semiconductor layer, the electron barrier layer including a nitride-based semiconductor containing at least Al. The electron barrier layer has a first region in which an Al composition changes. The Al composition in the first region monotonically increases in a direction from the active layer to the second-conductivity-side first semiconductor layer. An impurity concentration in the second-conductivity-side first semiconductor layer is lower in a region nearer the electron barrier layer than in a region farther from the electron barrier layer.


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