The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2020

Filed:

Jun. 28, 2018
Applicant:

Duet Microelectronics Llc, Raritan, NJ (US);

Inventors:

Keun-Yong Ban, Raritan, NJ (US);

Robert J. Bayruns, Raritan, NJ (US);

Assignee:

XG MICROELECTRONICS INC., Raritan, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8249 (2006.01); H01L 29/66 (2006.01); H01L 29/737 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 29/205 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66318 (2013.01); H01L 29/0817 (2013.01); H01L 29/0821 (2013.01); H01L 29/1004 (2013.01); H01L 29/205 (2013.01); H01L 29/7371 (2013.01);
Abstract

A heterojunction bipolar transistor (HBT) and methods of fabrication provide a substrate, a base having a first lateral area, an emitter, a sub-collector having a second lateral area, and a collector above the sub-collector, wherein the second lateral area of the sub-collector is less than the first lateral area of the base, which enables the fabrication of HBTs with high linearity, as measured by an improved third order distortion (OIP3) parameter, while maintaining high gain; which enables the fabrication of HBTs with a selectively grown or overgrown collector/sub-collector; and which reduces a capacitance between the base and collector of the HBTs.


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