The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2020
Filed:
Oct. 05, 2016
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Jong-Seok Lim, Hwaseong-si, KR;
Hyeun-Su Kim, Suwon-si, KR;
Jung-Hoon Sung, Seoul, KR;
Kweon-Jae Lee, Hwaseong-si, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
A mask including a mask substrate including a cell exposure region and a peripheral exposure region, the cell exposure region configured to expose a metal layer in a cell region of a semiconductor device, the peripheral exposure region configured to expose a metal layer in a peripheral region of the semiconductor device, a first mask pattern configured to expose the metal layer in the peripheral exposure region of the mask substrate to form a signal metal pattern, and a second mask pattern configured to expose the metal layer in the peripheral exposure region of the mask substrate to form a dummy metal pattern, the second mask pattern being adjacent to the first mask pattern, and the second mask pattern having a substantially same width as a width of the first mask pattern may be provided.