The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2020

Filed:

Oct. 18, 2018
Applicant:

Samsung Display Co., Ltd., Yongin-si, Gyeonggi-do, KR;

Inventors:

Dong Kyun Ko, Hwaseong-si, KR;

Woo Jin Kim, Hwaseong-si, KR;

Myung Soo Huh, Suwon-si, KR;

In Kyo Kim, Seongnam-si, KR;

Keun Hee Park, Seoul, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Yongin-si, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); C23C 16/448 (2006.01); C23C 16/452 (2006.01); C23C 16/455 (2006.01); H01L 29/51 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28185 (2013.01); C23C 16/4488 (2013.01); C23C 16/452 (2013.01); C23C 16/455 (2013.01); H01L 21/28194 (2013.01); H01L 21/28202 (2013.01); H01L 29/518 (2013.01);
Abstract

A deposition apparatus includes a chamber, a susceptor that supports a substrate in the chamber, an upper electrode facing the susceptor, a showerhead defining a gas inlet space between the upper electrode and the susceptor, a metal source storage to store a metal source supplied to the chamber, a vaporizer to vaporize the metal source, a first gas source to supply a first gas to move the metal source toward the vaporizer, a second gas source to supply a second gas to move the metal source in the vaporizer toward the chamber, a third gas source connected to the chamber to supply a third gas into a reaction space defined between the susceptor and the upper electrode such that the third gas reacts with the metal source, and a fourth gas source connected to the chamber to supply a fourth gas used to clean an inside of the chamber.


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