The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2020
Filed:
Aug. 13, 2019
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Michael Engel, Rio de Janeiro, BR;
Mathias B. Steiner, Rio de Janeiro, BR;
Jaione Tirapu Azpiroz, Rio de Janeiro, BR;
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); H01L 21/02 (2006.01); H01L 51/10 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
H01L 21/02376 (2013.01); H01L 51/0023 (2013.01); H01L 51/0048 (2013.01); H01L 51/102 (2013.01); B82Y 40/00 (2013.01); H01L 51/0045 (2013.01); Y10S 977/742 (2013.01);
Abstract
A method of positioning nanomaterials includes patterning guiding dielectric features from a single layer of guiding dielectric material, and producing an electric field by at least one electrode disposed on a substrate that is attenuated through the guiding dielectric features to create an attractive dielectrophoretic force that guides at least one nanostructure abutting the guiding dielectric features to be positioned on a deposition surface of the substrate.