The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2020
Filed:
Oct. 23, 2017
Omnivision Technologies, Inc., Santa Clara, CA (US);
Alan Martin, San Jose, CA (US);
Edward Nabighian, San Jose, CA (US);
OmniVision Technologies, Inc., Santa Clara, CA (US);
Abstract
A method for manufacturing a stepped spacer wafer for a wafer-level camera includes a step of measuring a plurality of focal lengths fof a respective one of a plurality of lenses Lof a lens wafer. The method also includes a step of fabricating a stepped spacer wafer including (i) a plurality of apertures Atherethrough, and (ii) a plurality of thicknesses Tdefining a respective thickness of the stepped spacer wafer at least partially surrounding a respective one of the plurality of apertures A. Each of the plurality of thicknesses Tis equal to a difference between (a) a respective one of the plurality of focal lengths f, and (b) a uniform thickness that is the same for each of the plurality of thicknesses.