The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2020

Filed:

Oct. 04, 2013
Applicants:

Jean-pierre Leburton, Urbana, IL (US);

The Board of Trustees of the University of Illinois, Urbana, IL (US);

Inventor:

Jean-Pierre Leburton, Urbana, IL (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/447 (2006.01); G01N 27/453 (2006.01); G01N 33/487 (2006.01); C12Q 1/6869 (2018.01);
U.S. Cl.
CPC ...
G01N 27/447 (2013.01); C12Q 1/6869 (2013.01); G01N 27/453 (2013.01); G01N 33/48721 (2013.01);
Abstract

Aspects of the subject disclosure may include, for example, an apparatus including a material having one or more atomic layers with two or less degrees of freedom for motion of charges in the material, and a gate coupled to the material for controlling charge concentration of the material. The material can have constricted sides, a first through-hole, and a first port and a second port for conduction of charges in the material. The gate can have a second through-hole that is at least partially aligned with the first through-hole. A first voltage potential can be applied to the first port and the second port, along with a second voltage potential applied to the gate which adjusts the charge concentration of the material. A sensor can be used to measure a change in electrical properties of the material caused by a target material traversing the first through-hole of the material. Additional embodiments are disclosed.


Find Patent Forward Citations

Leburton, Jean-Pierre. (2020). Method and apparatus analyzing a target material (U.S. Patent No. 10677752). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10677752

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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