The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2020
Filed:
Oct. 29, 2014
Applicant:
Toshiba Mitsubishi-electric Industrial Systems Corporation, Chuo-ku, JP;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/503 (2006.01); H01L 21/31 (2006.01); H05H 1/24 (2006.01); B01J 4/00 (2006.01); C23C 16/04 (2006.01); C23C 16/452 (2006.01); C23C 16/513 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45561 (2013.01); B01J 4/00 (2013.01); C23C 16/045 (2013.01); C23C 16/452 (2013.01); C23C 16/455 (2013.01); C23C 16/4551 (2013.01); C23C 16/4557 (2013.01); C23C 16/45559 (2013.01); C23C 16/45563 (2013.01); C23C 16/45572 (2013.01); C23C 16/45582 (2013.01); C23C 16/503 (2013.01); C23C 16/513 (2013.01); H01L 21/31 (2013.01); H05H 1/24 (2013.01);
Abstract
The gas jetting apparatus according to the present invention includes a gas jetting cell unit for rectifying a gas and jetting the rectified gas into the film formation apparatus. The gas jetting cell unit has a fan shape internally formed with a gap serving as a gas route. A gas in a gas dispersion supply unit enters from a wider-width side of the fan shape into the gap, and, due to the fan shape, the gas is rectified, accelerated, and output from a narrower-width side of the fan shape into the film formation apparatus.