The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2020
Filed:
Jan. 16, 2015
Applicant:
United Technologies Corporation, Hartford, CT (US);
Inventor:
Bart A. Van Hassel, Weatogue, CT (US);
Assignee:
RAYTHEON TECHNOLOGIES CORPORATION, Farmington, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/34 (2014.01); B23K 26/12 (2014.01); B23K 26/14 (2014.01); B33Y 30/00 (2015.01); B33Y 10/00 (2015.01); B22F 3/105 (2006.01); B29C 64/364 (2017.01); B01D 47/00 (2006.01); B29C 64/35 (2017.01); B29C 64/153 (2017.01);
U.S. Cl.
CPC ...
B33Y 30/00 (2014.12); B01D 47/00 (2013.01); B22F 3/1055 (2013.01); B29C 64/364 (2017.08); B33Y 10/00 (2014.12); B22F 2003/1056 (2013.01); B22F 2003/1059 (2013.01); B22F 2201/00 (2013.01); B22F 2999/00 (2013.01); B29C 64/153 (2017.08); B29C 64/35 (2017.08);
Abstract
An additive processing apparatus includes a chamber and an irradiation device that together are operable to additively fabricate an article from a powder layer-by-layer in a work space in the chamber. A gas recirculation loop is connected at a first end thereof to an outlet of the chamber and at a second end thereof to an inlet of the chamber. The gas recirculation loop includes at least one purification device that is configured to remove impurities from a cover gas and generate a clean cover gas.