The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2020

Filed:

Sep. 04, 2015
Applicant:

Osg Corporation, Toyokawa-shi, Aichi, JP;

Inventors:

Masatoshi Sakurai, Toyokawa, JP;

Mei Wang, Toyokawa, JP;

Hiroaki Sugita, Toyokawa, JP;

Assignee:

OSG CORPORATION, Toyokawa-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 27/14 (2006.01); B23B 27/14 (2006.01); C23C 28/00 (2006.01); C23C 14/32 (2006.01); C23C 30/00 (2006.01); C23C 28/04 (2006.01); C23C 14/02 (2006.01); B23B 51/00 (2006.01); B23C 5/16 (2006.01); C23C 14/06 (2006.01);
U.S. Cl.
CPC ...
B23B 27/148 (2013.01); B23B 51/00 (2013.01); B23C 5/16 (2013.01); C23C 14/024 (2013.01); C23C 14/0641 (2013.01); C23C 14/325 (2013.01); C23C 28/04 (2013.01); C23C 28/044 (2013.01); C23C 28/42 (2013.01); C23C 28/44 (2013.01); C23C 30/005 (2013.01); B23B 2228/08 (2013.01); B23B 2228/10 (2013.01);
Abstract

A hard coating, which is to be disposed to cover a surface of a substrate, has a total thickness of 0.5-20 μm, and includes an A layer and nanolayer-alternated layer that are alternately laminated by physical vapor deposition. The nanolayer-alternated layer includes a B layer and a C layer that are alternately laminated. The A layer has a thickness of 50-1000 nm and is AlCr nitride that is represented by a composition formula of [AlCr]N wherein an atomic ratio U is 0.20-0.80. The B layer has a thickness of 1-100 nm and is TiAl nitride that is represented by a composition formula of [TiAl]N wherein an atomic ratio W is 0.30-0.85. The C layer has a thickness of 1-100 nm and is TiSi nitride that is represented by a composition formula of [TiSi]N wherein an atomic ratio Y is 0.05-0.45. The nanolayer-alternated layer has a thickness of 50-1000 nm.


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