The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10672939 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 02, 2020

Filed:

Sep. 10, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Sunit S. Mahajan, Somers, NY (US);

Teodor K. Todorov, Yorktown Heights, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/18 (2006.01); H01L 31/032 (2006.01); C23C 14/06 (2006.01); C23C 14/24 (2006.01); C23C 16/455 (2006.01); C23C 16/46 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
H01L 31/18 (2013.01); C23C 14/0629 (2013.01); C23C 14/24 (2013.01); C23C 16/455 (2013.01); C23C 16/46 (2013.01); C23C 16/52 (2013.01); H01L 31/0322 (2013.01); H01L 31/0324 (2013.01); H01L 31/0326 (2013.01); Y02E 10/541 (2013.01); Y02P 70/521 (2015.11);
Abstract

Techniques for precisely controlling the composition of volatile components (such as sulfur (S), selenium (Se), and tin (Sn)) of chalcogenide semiconductors in real-time—during production of the material are provided. In one aspect, a method for forming a chalcogenide semiconductor material includes providing a S source(s) and a Se source(s); heating the S source(s) to form a S-containing vapor; heating the Se source(s) to form a Se-containing vapor; passing a carrier gas first through the S-containing vapor and then through the Se-containing vapor, wherein the S-containing vapor and the Se-containing vapor are transported via the carrier gas to a sample; and contacting the S-containing vapor and the Se-containing vapor with the sample under conditions sufficient to form the chalcogenide semiconductor material. A multi-chamber processing apparatus is also provided.


Find Patent Forward Citations

Mahajan, Sunit. (2020). Anneal techniques for chalcogenide semiconductors (U.S. Patent No. 10672939). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10672939

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