The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2020

Filed:

Nov. 02, 2017
Applicant:

Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Wuhan, Hubei, CN;

Inventors:

Lei Yu, Hubei, CN;

Songshan Li, Hubei, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); H01L 29/49 (2006.01); H01L 29/66 (2006.01); H01L 21/265 (2006.01); H01L 21/266 (2006.01); H01L 21/02 (2006.01); H01L 21/28 (2006.01); H01L 27/12 (2006.01); H01L 51/56 (2006.01); H01L 27/32 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/78609 (2013.01); H01L 21/0217 (2013.01); H01L 21/02164 (2013.01); H01L 21/02274 (2013.01); H01L 21/02532 (2013.01); H01L 21/02592 (2013.01); H01L 21/02675 (2013.01); H01L 21/266 (2013.01); H01L 21/26513 (2013.01); H01L 21/28079 (2013.01); H01L 21/28158 (2013.01); H01L 27/1222 (2013.01); H01L 27/1274 (2013.01); H01L 27/1288 (2013.01); H01L 27/3246 (2013.01); H01L 27/3248 (2013.01); H01L 27/3258 (2013.01); H01L 27/3262 (2013.01); H01L 29/42384 (2013.01); H01L 29/4908 (2013.01); H01L 29/66492 (2013.01); H01L 29/66598 (2013.01); H01L 29/66757 (2013.01); H01L 29/78621 (2013.01); H01L 29/78675 (2013.01); H01L 51/56 (2013.01); H01L 2227/323 (2013.01); H01L 2251/308 (2013.01);
Abstract

The disclosure provides an N-type thin film transistor, including a poly-silicon layer, a gate layer, a source and a drain. The poly-silicon layer includes a channel region, a source region and a drain region at two side of the channel region. The gate layer is on the channel region, a projection of the gate layer on the poly-silicon layer partially overlaps the source region and the drain region, and a thickness of the gate layer on the source region and the drain region are smaller than a thickness of the gate layer on the channel region. The source region and the drain region both include a heavily-doping region and a lightly-doping region connected to the heavily-doping region, the source and the drain are respectively on the heavily-doping region of the source region and the drain, and respectively electrically connects to the heavily-doping region of the source region and the drain.


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