The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2020
Filed:
Sep. 21, 2018
Chevron U.s.a. Inc., San Ramon, CA (US);
Tao Sun, Sugar Land, TX (US);
Morgan Sullivan, Houston, TX (US);
Michael James Pyrcz, Houston, TX (US);
Martin Perlmutter, Houston, TX (US);
Jacob Covault, Houston, TX (US);
Chevron U.S.A. Inc., San Ramon, CA (US);
Abstract
Depth-averaged flow simulation systems and methods provided herein employ parameterized templates for dynamical depth profiling for at least one step of a simulation. In one illustrative computer-based embodiment, the simulation method includes, for each map point at one given time step: determining a flow template and a sediment concentration template based on depth-averaged flow velocity and depth-averaged sediment concentrations of different classes of grain size for that map point; employing the templates to construct a vertically-distributed flow velocity profile and vertically-distributed sediment concentration profiles for associated classes of grain size for that map point, thereby obtaining 3D flow velocity and 3D sediment concentration fields; using the 3D fields to calculate fluid and sediment fluxes; updating the flow velocity and sediment concentration profiles based on the divergence of the fluxes; integrating the profiles to compute updated depth-averaged flow velocity and sediment concentrations and center of gravity; and solving the depth-averaged flow equations for the next time step.