The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2020
Filed:
Feb. 25, 2016
Applicant:
Screen Holdings Co., Ltd., Kyoto, JP;
Inventor:
Yusuke Akizuki, Kyoto, JP;
Assignee:
SCREEN Holdings Co., Ltd., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 11/10 (2006.01); G03F 7/42 (2006.01); H01L 21/67 (2006.01); H01L 21/311 (2006.01); B05C 11/08 (2006.01); B05D 7/24 (2006.01); H01L 21/027 (2006.01); C09K 13/08 (2006.01);
U.S. Cl.
CPC ...
B05C 11/1039 (2013.01); B05C 11/08 (2013.01); B05C 11/1042 (2013.01); B05D 7/24 (2013.01); G03F 7/423 (2013.01); G03F 7/425 (2013.01); H01L 21/027 (2013.01); H01L 21/31133 (2013.01); H01L 21/67 (2013.01); C09K 13/08 (2013.01);
Abstract
In order to solve the problem of satisfactorily removing a resist from the surface of a substrate, the present invention is a substrate processing device () having a spin chuck () and an SPM feed unit () for feeding SPM to the substrate (W) held by the spin chuck (), wherein the SPM feed unit () includes a mixing unit () for mixing an aqueous hydrogen peroxide solution and hydrofluoric acid and producing a liquid mixture of hydrogen peroxide water and hydrofluoric acid, and an HF-mixed SPM production unit () for mixing the liquid mixture and sulfuric acid and producing HF-mixed SPM.