The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2020

Filed:

Aug. 29, 2016
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Gi-Nam Park, Incheon, KR;

Bokyung Jung, Seoul, KR;

Leekwon Gil, Yongin-si, KR;

Jungwoo Seo, Hwaseong-si, KR;

Dongseok Baek, Hwaseong-si, KR;

Nam Hoon Lee, Ansan-si, KR;

Jonghyun Lee, Bucheon-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/687 (2006.01); H05B 3/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); H01L 21/6875 (2013.01); H01L 21/68735 (2013.01); H01L 21/68785 (2013.01); H05B 3/0047 (2013.01);
Abstract

An apparatus for treating a substrate includes a chamber including a space in which a substrate is treated, a support member disposed in the chamber and supporting the substrate, and a heating member for heating the substrate. The space is divided into an upper space and a lower space by the support member. The support member includes a support plate receiving the substrate, a base supporting the support plate, exposing a bottom surface of the support plate and including a cut region formed in an edge portion of the base, and an adjustment block held in the cut region and coupled to the base. The cut region fluidly connects the upper space to the lower space. The adjustment block divides the cut region into a plurality of vents.


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