logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10665472 B1

PDFFull Text
Date of Patent:
May. 26, 2020

Filed:

Mar. 28, 2017

System and method for removing foreign substances by using electric field adsorption method

Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Dongmyung Shin, Daejeon, KR;

Sang Ki Chun, Daejeon, KR;

Bum Woo Lee, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:

Dentons US LLP

Primary Examiner:

Angel Roman

Int. Cl.
CPC ...
H01L 21/479 (2006.01); H01L 21/768 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); B08B 3/10 (2006.01); B08B 17/02 (2006.01); F04B 19/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/479 (2013.01); B08B 3/10 (2013.01); B08B 17/02 (2013.01); F04B 19/00 (2013.01); F04B 19/006 (2013.01); H01L 21/02422 (2013.01); H01L 21/67028 (2013.01); H01L 21/76865 (2013.01); H01L 21/02057 (2013.01);
Abstract

The present invention relates to a system and a method of removing a foreign material by using an electric field adsorbing scheme, which are capable of easily adsorbing and removing a foreign material on a surface of a film by using an electric field adsorbing scheme through a micro-current (several micro ampere) voltage driving method, not a surface treatment method, such as plasma discharge processing, corona discharge processing, and air blowing processing, which causes damage to the surface of the film, in a processing process for removing the foreign material on the surface of the film, and particularly, which exclude high pressure discharge processing and the like, thereby decreasing an incurrence rate of a safety accident of an operator and preventing a surface of a film from being scratched.

Find Patent Forward Citations

Shin, Dongmyung. (2020). System and method for removing foreign substances by using electric field adsorption method (U.S. Patent No. 10665472). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10665472

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…