The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2020
Filed:
Sep. 14, 2016
Samsung Sdi Co., Ltd., Yongin-si, Gyeonggi-do, KR;
Seulgi Jeong, Suwon-si, KR;
Minsoo Kim, Suwon-si, KR;
Sunghwan Kim, Suwon-si, KR;
Hyunji Song, Suwon-si, KR;
Sunhae Kang, Suwon-si, KR;
Youngmin Kim, Suwon-si, KR;
Yoona Kim, Suwon-si, KR;
Jinhyung Kim, Suwon-si, KR;
Younhee Nam, Suwon-si, KR;
Jaeyeol Baek, Suwon-si, KR;
Byeri Yoon, Suwon-si, KR;
Chungheon Lee, Suwon-si, KR;
Seunghee Hong, Suwon-si, KR;
Sunmin Hwang, Suwon-si, KR;
Samsung SDI Co., Ltd., Yongin-Si, Gyeonggi-do, KR;
Abstract
A method of producing a layer structure and a method of forming a pattern, the method of producing a layer structure including coating a first composition on a substrate that has a pattern thereon; curing the coated first composition to form a first organic layer; applying a liquid material to the first organic layer to remove a part of the first organic layer; and coating a second composition on remaining parts of the first organic layer; and curing the coated second composition on the remaining parts of the first organic layer to form a second organic layer: wherein the first composition and the second composition each independently include a solvent, and a polymer including a structural unit represented by Chemical Formula 1,*A-B*.  [Chemical Formula 1]