The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2020
Filed:
Feb. 03, 2017
Canon Kabushiki Kaisha, Tokyo, JP;
Tatusya Hayashi, Utsunomiya, JP;
Yosuke Murakami, Utsunomiya, JP;
Noriyasu Hasegawa, Utsunomiya, JP;
Hirotoshi Torii, Utsunomiya, JP;
Yusuke Tanaka, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An imprint apparatus that forms a pattern of an imprint material on a substrate-side pattern region of a substrate by using a mold. The imprint apparatus includes a light irradiation unit configured to irradiate the imprint material with light having a first wavelength for curing, and a heating unit configured to heat a partial region of the substrate, the partial region corresponding to the substrate-side pattern region, by irradiating the substrate with light that has passed through the mold and has a second wavelength different from the light having the first wavelength. The heating unit is configured to heat the partial region to deform the substrate-side pattern region by forming an uneven temperature distribution on the substrate-side pattern region by irradiation of the light having the second wavelength with an uneven illumination distribution.