The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2020

Filed:

Dec. 19, 2013
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Hefei Boe Optoelectronics Technology Co., Ltd., Hefei, Anhui, CN;

Inventors:

Xianxue Duan, Beijing, CN;

Mingji Bai, Beijing, CN;

Dezhi Xu, Beijing, CN;

Zhixiang Zou, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); G02F 1/1362 (2006.01); G02F 1/1343 (2006.01); G02F 1/1368 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
G02F 1/136286 (2013.01); G02F 1/1368 (2013.01); G02F 1/134309 (2013.01); G02F 1/136227 (2013.01); H01L 27/124 (2013.01); H01L 27/1225 (2013.01); H01L 27/1248 (2013.01); H01L 27/1288 (2013.01); H01L 29/7869 (2013.01); G02F 2001/134318 (2013.01); G02F 2001/134372 (2013.01); G02F 2001/136236 (2013.01); G02F 2001/136295 (2013.01); G02F 2201/121 (2013.01); G02F 2201/123 (2013.01);
Abstract

A method for manufacturing a display substrate includes a step of forming a pattern of a barrier layer and a pattern of a first electrode. The step of forming the pattern of the barrier layer and the pattern of the first electrode includes: forming a barrier layer film and a first electrode film sequentially; and forming the pattern of the barrier layer and the pattern of the first electrode by a single patterning process.


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