The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2020
Filed:
Apr. 27, 2018
Luminar Technologies, Inc., Orlando, FL (US);
John E. McWhirter, Winter Park, FL (US);
Luminar Technologies, Inc., Orlando, FL (US);
Abstract
A technique for manufacturing highly balanced rotatable polygon mirrors for use in scanners includes forming a block having a first wall, a second wall, and reflective surfaces extending between the first and second walls, the surfaces being angularly offset from one another along a periphery of the block. The technique includes applying a coarse balancing procedure to the block, making the surfaces reflective, mating the block to a motor, and applying a precise balancing procedure to the block. The technique also includes imparting rotation to the block and removing material from the block via the first wall using high-energy laser pulses.