The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2020

Filed:

Jun. 13, 2017
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Ordos Yuansheng Optoelectronics Co., Ltd., Inner Mongolia, CN;

Inventors:

Zhiming Lin, Beijing, CN;

Zhen Wang, Beijing, CN;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); B05C 21/00 (2006.01); H01L 51/56 (2006.01); C23C 14/24 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); B05C 21/005 (2013.01); C23C 14/24 (2013.01); H01L 51/56 (2013.01); H01L 51/0011 (2013.01);
Abstract

A mask, a method for manufacturing a mask, and a mask assembly are disclosed. The mask includes an effective region for evaporation and an edge region between an edge of the effective region for evaporation extending in a stretching direction and an edge of the mask extending in the stretching direction. The edge region is provided with a bending relieving structure for relieving a curling of the edge of the effective region for evaporation when the mask is stretched in the stretching direction.


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