The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2020
Filed:
Feb. 20, 2018
Seiko Epson Corporation, Tokyo, JP;
Masashi Kanai, Azumino, JP;
SEIKO EPSON CORPORATION, Tokyo, JP;
Abstract
A method for creating a test pattern includes creating a reference ruled line set by ejecting ink from a nozzle formed in a first print tip among a plurality of print tips, and creating a measurement ruled line set by ejecting ink from a nozzle formed in a second print tip among the plurality of print tips. A ruled line in the reference ruled line set and a ruled line in the measurement ruled line set whose positions align in a secondary scan direction when no impact displacement is present in the secondary scan direction are designated as specified ruled lines. The test pattern is created such that spacings between the ruled lines within the reference ruled line set and spacings between the ruled lines within the measurement ruled line set increase on progression in the secondary scan direction away from the specified ruled lines.