The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2020

Filed:

Oct. 30, 2015
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Takuro Yamazaki, Utsunomiya, JP;

Tomomi Funayoshi, Utsunomiya, JP;

Hiromitsu Yamaguchi, Yokohama, JP;

Masayoshi Fujimoto, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 43/58 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
B29C 43/58 (2013.01); G03F 7/0002 (2013.01);
Abstract

The present invention provides an imprint system including a processing unit configured to perform an imprint process, the processing unit including a dispenser configured to supply a droplet of an imprint material onto a substrate, a library configured to manage a plurality of different maps each indicating at least one of a supply position and a supply amount for a droplet to be supplied on the substrate from the dispenser, and a control unit configured to select one map to be used in the imprint process from the plurality of maps managed in the library based on information about a change of a result of the imprint process caused by a temporal change of at least one of a mold and the dispenser.


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