The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2020

Filed:

May. 19, 2016
Applicant:

Xuan Wang, San Luis Obispo, CA (US);

Inventor:

Xuan Wang, San Luis Obispo, CA (US);

Assignee:

Cal Poly Corporation, San Luis Obispo, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C04B 38/00 (2006.01); B28B 17/02 (2006.01); C04B 38/06 (2006.01); C04B 111/00 (2006.01);
U.S. Cl.
CPC ...
B28B 17/026 (2013.01); C04B 38/0615 (2013.01); C04B 2111/00801 (2013.01);
Abstract

Novel methods of fabricating porous structures (e.g., nanostructures) and resulting structures are disclosed. The novel methods use precision optics to cure a slurry made from one or more powders mixed with photopolymers. Pore size control preferably is achieved by controlling the powder size and powder loading in the slurry. As the disclosed methods are based on optics to control the thickness preferably without any mechanical movements, extreme tight thickness tolerance, as well as control of the profile structure, may be achieved. The novel disclosed methods are highly-cost effective with shorter manufacturing cycle time compared to conventional methods. Moreover, a supporting substrate may not be required as the resultant structure made by the novel fabrication techniques disclosed herein has enough strength to be free-standing.


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