The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2020

Filed:

May. 18, 2018
Applicant:

Ossia Inc., Bellevue, WA (US);

Inventors:

Hatem I. Zeine, Bellevue, WA (US);

Caner Guclu, Bellevue, WA (US);

Assignee:

OSSIA INC., Bellevue, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 3/36 (2006.01); H01Q 19/10 (2006.01); H01Q 3/46 (2006.01); H01Q 3/20 (2006.01); H01Q 3/24 (2006.01); H01Q 15/00 (2006.01); H01Q 21/28 (2006.01);
U.S. Cl.
CPC ...
H01Q 3/36 (2013.01); H01Q 3/20 (2013.01); H01Q 3/24 (2013.01); H01Q 3/46 (2013.01); H01Q 15/002 (2013.01); H01Q 19/10 (2013.01); H01Q 21/28 (2013.01);
Abstract

Embodiments of an aperture expansion flap are disclosed. An aperture expansion flap may be used in conjunction with an antenna to expand an effective aperture of the antenna beyond its physical area, geometry, and orientation. An aperture expansion flap may include one or more resonators which may be tuned to adjust a reflection and/or refraction phase of an incident wireless signal, such that the wireless signal may be reflected and/or refracted at angle of reflection and/or refraction that is different than an angle of incidence.


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