The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2020
Filed:
Jun. 20, 2014
Advanced Material Technologies, Inc., Chiba, JP;
Kouji Abe, Chiba, JP;
Toshiyuki Watanabe, Chiba, JP;
Masafumi Tanaka, Chiba, JP;
Kohei Okudaira, Chiba, JP;
Hiroyasu Sekino, Chiba, JP;
Yuuji Honda, Chiba, JP;
ADVANCED MATERIAL TECHNOLOGIES, INC., Chiba, JP;
Abstract
A plasma CVD device includes a chamber (), an anode (), a cathode (), a holding portion which holds a substrate to be deposited () a plasma wall () an anti-adhesion member () which is arranged between a first gap () between the anode and the plasma wall and a first inner surface () of the chamber and a pedestal () which is arranged between the anti-adhesion member and a back surface of the anode and which is electrically connected to the anode. The maximum diameter of each of the first gap, a second gap () between the anode and the anti-adhesion member, a third gap () between the back surface of the anode and the pedestal, a fourth gap () between the plasma wall and the anti-adhesion member and a fifth gap () between the anti-adhesion member and the pedestal is equal to or less than 4 mm.