The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2020
Filed:
Oct. 02, 2019
Citrine Informatics, Inc., Redwood City, CA (US);
Yoolhee Kim, Oakland, CA (US);
Erin Melissa Tan Antono, Palo Alto, CA (US);
Edward Soo Kim, Medicine Hat, CA;
Bryce William Meredig, San Carlos, CA (US);
Julia Black Ling, Redwood City, CA (US);
CITRINE INFORMATICS, INC., Redwood City, CA (US);
Abstract
A system and a method are disclosed for predicting design space quality for materials development and manufacture. In an embodiment, a processor receives input of a material property and a design space. The processor identifies a best data point. For each respective candidate material of the design space, the processor receives, as output from a model, a respective property value. The processor determines respective property values that exceed the property value of the best data point adds them to a subset of candidate materials. The processor determines a PFIC score for candidates in the subset. The processor generates a plurality of curves, each reflecting a respective probability distribution of property values. The processor determines a CMLI score based on the plurality of respective curves. The processor determines that the design space is high quality based on the PFIC and CMLI scores, and outputs a recommendation to proceed.